Abstract
EUV optics enable ever finer structures on computer chips with high transistor density, powerful and energy-efficient capability. During this talk we will share how EUV light is generated for high-volume chip manufacturing. Then we will review how EUV mirrors collect and direct the light from laser-produced plasma to photomasks and transform tiny patterns to silicon wafers. We will discuss technical challenges associated with the mirrors. Finally, we would like to discuss how Rochester optical community can contribute.
About the speaker
Dr. Jue Wang is a Senior Development Associate at Corning Advanced Optics and was inducted as an SPIE Fellow in 2023. Jue’s interests are optical surfaces, interfaces and coating technologies, and nano-structured optical materials. Jue’s work contributes to DUV optics for chip-scan lasers, narrowband and broadband chip-inspection optics, laser durable and environmental resilient VIS-IR optics for A&D. Jue received his BS degree in Surface Physics and Optics from Fudan University and his PhD in Semiconductor Materials and Device Physics from the Shanghai Institute of Technical Physics at the Chinese Academy of Sciences. Jue was also German Volkswagen and DAAD research fellows at Wuerzburg University.
Parking
Parking is available in the Mortimer Street and St. Joseph’s garages, enter via the SkyBridge on the 3rd floor of either garage to enter the Sibley Building on the 2nd floor, head to the business office and use the elevators to the 6th floor.
There is also ample street parking around the building. Enter via the business lobby and take the business elevators to the sixth floor.
Pre-talk dinner
