Annual Student Talks
Rajiv Sejpal, Rochester Institute of Technology
Arturo Canales, University of Rochester
Semiconductor Scaling and Advanced Lithography Techniques
Rajiv Sejpal, Rochester Institute of Technology
Abstract
The evolution of the projection lithography systems, specifically, improvements in laser sources and lens design, can be directly correlated to the quality of consumer electronics products. In 2020, NVIDIA’s graphic processing unit (GPU) then recorded the highest component density of 54 billion. Projection lithography is a diffraction limited refractive imaging system which is characterized by its resolution and depth of focus (DOF). Therefore, a reduction in wavelength or increase in the NA enables smaller feature sizes. The current technological node utilizes extreme ultraviolet lithography (EUVL) systems. EUVL systems employ a 13.5nm source wavelength at 0.33NA. At such EUV wavelengths, most materials become absorbing, rendering refractive imaging nearly impossible. EUVL systems therefore incorporate reflective optical elements, specifically a photomask and lens assembly that operate on Bragg reflection. Due to the oblique illumination angles and the current mask architecture, EUVL suffers from mask 3D effects such as shadowing, best focus shifts and non-telecentricity errors. To reduce some of these M3D effects, thinner alternative absorber materials are proposed for next generation EUV lithography. This talk provides a brief introduction to the optical lithography evolution. We then focus on the current state of the art EUV lithography and some of its immediate challenges. Finally, the future of EUV lithography, namely anamorphic EUV lithography is introduced.
About the speaker
I am PhD student at Rochester Institute of Technology (RIT) working with Dr. Bruce Smith. I also have a master’s degree in Microelectronics Engineering from RIT and a bachelor’s in Electronics Engineering from Pune University. Currently, my research focuses on attenuated phase shifting mask absorber materials for EUVL masks. I have worked as an Assignee for Mentor, a Siemens Business at IMEC in Leuven Belgium where I mainly focused on source-mask optimization (SMO) and EUV modeling. I have also interned at Cymer, ASML working on 193i laser source manipulation for optimized imaging. Personally, I enjoy working out and cooking. I am big fan of football (soccer) and love traveling to different countries, so I aim to see a live World Cup game!
High-resolution, coherent-artifacts-free, 3-dimensional imaging in broadband coherence interferometric microscopy
Arturo Canales, University of Rochester
Abstract
I will present a synthetic-phase modulation method in combination with an ISAM-based reconstruction algorithm that provides high-resolution, artifacts-free imaging to data acquired with a confocal swept-source optical coherence tomographic system. Numerical and experimental results will be presented.
About the speaker
Future Machine Vision engineer at Corning Incorporated, Arturo Canales is currently a fifth year PhD Optics student working under the supervision of Scott Carney, current CTO at Optica, and James Zavislan, associate professor at The Institute of Optics. His research work has revolved around the use of interferometric imaging methods for metrology and biomedical applications. Currently, his research is oriented towards the development of more robust optical instrumentation and phase modulation methods for broadband interferometric confocal microscopy. Applications in metrology include surface topography and inspection; applications in biomedical imaging include optical tomography (OCT) and quantitative biology such as morphology analysis of cells and tissue.
LLE COVID policy
Surgical, N-95 or KN-95 Masks are presently required for all people in LLE facilities. Disinfectant wipes will be available for attendee use.
Pre-talk dinner
Pre-talk dinner
with speakers Rajiv Sejpal and Arturo Canales will be held at 5:00 PM at Phillips European Restaurant, 26 Corporate Woods, Rochester NY 14623, prior to the talk. Contact the House Committee by email for dinner reservations. Email: house@osarochester.org
